Tantalum (Ta) ICP Standard Solution 1 g/l in 5% HNO, 1% HF traceable to NIST
- Cat. No.
- VQ-000279
VQ-000279
Tantalum crucibles, 99.9%, OD: 10 mm, Thick: 0.5 mm, Height: 15 mm
- CAS
- 7440-25-7
- Formula
- Ta
- MW
- 180.95 g/mol
VQ-018510
Tantalum crucibles, 99.95%, OD: 8 mm, Thick: 1 mm, Height: 25 mm
- CAS
- 7440-25-7
- Formula
- Ta
- MW
- 180.95 g/mol
VQ-018511
Tantalum pentoxide sputtering target, diam. x thickness 101.6 mm × 4 mm, 99.9%
- CAS
- 1314-61-0
- Formula
- O5Ta2
- MW
- 441.89 g/mol
VQ-017243
Tantalum pentoxide sputtering target, diam. x thickness 304.8 mm x 10 mm, 99.99% elastomer bonding to Copper backing plate 304.8mm dia x 16 mm thick
- CAS
- 1314-61-0
- Formula
- O5Ta2
- MW
- 441.89 g/mol
VQ-017244
Tantalum slug, 3.175mm (0.125in) dia x 3.175mm (0.125in) length, 99.95%
- CAS
- 7440-25-7
- Formula
- Ta
- MW
- 180.95 g/mol
VQ-016904
Tantalum sputtering target, 99.95% (L x W x Thick 700 x 25.4 x 3 mm)
- CAS
- 7440-25-7
- Formula
- Ta
- MW
- 180.95 g/mol
VQ-017246
Tantalum sputtering target, diam. × thickness 2 inch × 3 mm, 99.9%
- CAS
- 7440-25-7
- Formula
- Ta
- MW
- 180.95 g/mol
VQ-017250
Tantalum sputtering target, diam. x thickness 2 inch × 0.250 inch, 99.95%
- CAS
- 7440-25-7
- Formula
- Ta
- MW
- 180.95 g/mol
VQ-017247
Tantalum sputtering target, diam. x thickness 25.4 mm x 1 mm, 99.9%
- CAS
- 7440-25-7
- Formula
- Ta
- MW
- 180.95 g/mol
VQ-017248
Tantalum sputtering target, diam. x thickness 3 inch x 2.5 mm, 99.95%
- CAS
- 7440-25-7
- Formula
- Ta
- MW
- 180.95 g/mol
VQ-017249
Tantalum, sputtering target, 99.95% (L x W x Thick 14 x 1 x 2 mm)
- CAS
- 7440-25-7
- Formula
- Ta
- MW
- 180.95 g/mol
VQ-017251
Tantalum, sputtering target, diam. x thickness 1 inch x 0.125 inch, 99.95%
- CAS
- 7440-25-7
- Formula
- Ta
- MW
- 180.95 g/mol
VQ-017252