(4-Butyryl-2,3-dichlorophenoxy)-acetic Acid Ethyl Ester
- CAS
- 2977-51-7
- Formula
- C14H16Cl2O4
- MW
- 319.2 g/mol
VQ-030585
Impurity reference standards
Ethacrynic Acid impurities & reference standards
Characterised Ethacrynic Acid impurities, degradation products and related compounds for analytical method development, validation, QC release and regulatory filings.
15reference materials
1isotope-labelled
COAHPLC · NMR · MS on request
2-Desmethylene-2-hydroxymethyl Ethacrynic Acid
- CAS
- 95772-54-6
- Formula
- C13H14Cl2O5
- MW
- 321.15 g/mol
VQ-030583
2,2'-(((2,4-Diethylpentanedioyl)bis(2,3-dichloro-4,1-phenylene))bis(oxy))diacetic acid
- CAS
- 71545-13-6
- Formula
- C25H24Cl4O8
- MW
- 594.3 g/mol
VQ-025635
Ethacrynic Acid Mercapturate (Mixture of diastereomers)
- CAS
- 54546-23-5
- Formula
- C18H21Cl2NO7S
- MW
- 466.3 g/mol
VQ-048287
Ethyl 2-(2,3-dichloro-4-(2-methylenebutanoyl)phenoxy)acetate
- CAS
- 23870-41-9
- Formula
- C15H16Cl2O4
- MW
- 331.2 g/mol
VQ-037118
FAQs — Ethacrynic Acid impurities
Which Ethacrynic Acid impurities do you supply?
We list 15 Ethacrynic Acid-related reference materials, including process impurities, degradation products, stable-isotope-labelled standards and related compounds. Each is supplied with a COA, and characterisation data (HPLC, 1H-NMR, MS, IR) can be provided on request.
What are Ethacrynic Acid impurity standards used for?
They are used for analytical method development and validation, impurity identification and quantification, forced-degradation and stability studies, and to support ANDA, DMF and other regulatory submissions under ICH Q3A/Q3B (and ICH M7 for mutagenic impurities).
Can you synthesise a Ethacrynic Acid impurity that is not listed?
Yes. Our custom synthesis service can prepare and characterise unlisted impurities, metabolites and labelled analogues from milligram to gram scale. Share the structure or name and required quantity for a quotation.
Request Ethacrynic Acid impurity standards
We reply within one business day with price, pack options, lead time and documentation.