- CAS
- 7440-21-3
- Formula
- Si
- MW
- 28.09 g/mol
Silicon wafers, N-type, dia 4 inch, thick 0.50 mm [Thermal oxide wafer 300 nm SiO2 layer on Si (100)]
Silicon wafers, N-type, dia 4 inch, thick 0.50 mm [Thermal oxide wafer 300 nm SiO2 layer on Si (100)] – optical window. With COA, ships worldwide.
About Silicon wafers, N-type, dia 4 inch, thick 0.50 mm [Thermal oxide wafer 300 nm SiO2 layer on Si (100)]
Silicon wafers, N-type, dia 4 inch, thick 0.50 mm [Thermal oxide wafer 300 nm SiO2 layer on Si (100)] is an optical window from the Vaqora Chemicals catalogue.
The product is provided as a solid. Store sealed in a dry, well-ventilated location away from incompatible materials. Handle it with standard laboratory precautions and appropriate personal protective equipment.
Typical applications include optical windows, IR and UV optics and coated substrates. Typical end-use sectors are academic and industrial research and electronics and semiconductors.
We offer Silicon wafers, N-type, dia 4 inch, thick 0.50 mm [Thermal oxide wafer 300 nm SiO2 layer on Si (100)] in 1 pc and 10 x 1 pc packs with a batch-specific COA, and ship to customers worldwide. SDS and detailed specification sheets can be requested with your quotation.
Typical applications
- Optical windows
- IR & UV optics
- Coated substrates
Industries
Specifications & identifiers
| Product name | Silicon wafers, N-type, dia 4 inch, thick 0.50 mm [Thermal oxide wafer 300 nm SiO2 layer on Si (100)] |
|---|---|
| Catalogue No. | VQ-018130 |
| HSN code | 90019002 |
| Physical form | Solid |
|---|
Documents
Frequently asked questions
Which grade and pack sizes of Silicon wafers, N-type, dia 4 inch, thick 0.50 mm [Thermal oxide wafer 300 nm SiO2 layer on Si (100)] can I order?
We supply Silicon wafers, N-type, dia 4 inch, thick 0.50 mm [Thermal oxide wafer 300 nm SiO2 layer on Si (100)], in 1 pc, 10 x 1 pc packs. Larger bulk quantities and custom packing are quoted on request.
Do you provide a COA and SDS with Silicon wafers, N-type, dia 4 inch, thick 0.50 mm [Thermal oxide wafer 300 nm SiO2 layer on Si (100)]?
Yes. Every lot of Silicon wafers, N-type, dia 4 inch, thick 0.50 mm [Thermal oxide wafer 300 nm SiO2 layer on Si (100)] is shipped with a batch-specific Certificate of Analysis, and a 16-section GHS Safety Data Sheet is provided with the quotation and the shipment.
Can Silicon wafers, N-type, dia 4 inch, thick 0.50 mm [Thermal oxide wafer 300 nm SiO2 layer on Si (100)] be shipped internationally?
Yes. We export Silicon wafers, N-type, dia 4 inch, thick 0.50 mm [Thermal oxide wafer 300 nm SiO2 layer on Si (100)] worldwide by air and sea freight or express courier, on EXW, FOB, CIF, CFR or DAP Incoterms, with full export documentation.
Enquire about Silicon wafers, N-type, dia 4 inch, thick 0.50 mm [Thermal oxide wafer 300 nm SiO2 layer on Si (100)]
We reply within one business day with price, pack options, lead time and documentation.
Related products
- Cat. No.
- VQ-018131
- CAS
- 7440-21-3
- Formula
- Si
- MW
- 28.09 g/mol
- CAS
- 7440-21-3
- Formula
- Si
- MW
- 28.09 g/mol
- CAS
- 7440-21-3
- Formula
- Si
- MW
- 28.09 g/mol