Manganese sputtering target, diam. x thickness 2 inch x 0.250 inch, 99.95%
- CAS
- 7439-96-5
- Formula
- Mn
- MW
- 54.94 g/mol
VQ-017161
Inorganic Chemicals, Metals & Advanced Materials
Sputtering Targets & Evaporation Materials
Browse 285 sputtering targets & evaporation materials: identifiers, molecular data and pack sizes, with worldwide shipping.
285products
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Manganese sputtering target, diam. x thickness 25.4 mm x 1 mm, 99.9%
- CAS
- 7439-96-5
- Formula
- Mn
- MW
- 54.94 g/mol
VQ-017162
Manganese sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
- CAS
- 7439-96-5
- Formula
- Mn
- MW
- 54.94 g/mol
VQ-017163
Molybdenum sputtering target, diam. x thickness 25.4 mm x 1 mm, 99.9%
- CAS
- 7439-98-7
- Formula
- Mo
- MW
- 95.95 g/mol
VQ-017166
Molybdenum sputtering target, diam. x thickness 3 inch x 2.5 mm, 99.95%
- CAS
- 7439-98-7
- Formula
- Mo
- MW
- 95.95 g/mol
VQ-017167
Molybdenum sputtering target, diam. x thickness 3 inch x 3 mm, 99.99%
- CAS
- 7439-98-7
- Formula
- Mo
- MW
- 95.95 g/mol
VQ-017168
Molybdenum sputtering target, diam. x thickness 4 inch x 4 mm, 99.99%
- CAS
- 7439-98-7
- Formula
- Mo
- MW
- 95.95 g/mol
VQ-017169
Molybdenum sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
- CAS
- 7439-98-7
- Formula
- Mo
- MW
- 95.95 g/mol
VQ-017170
Molybdenum sputtering target, diam. x thickness 50.8 mm x 3.125 mm, 99.95%
- CAS
- 7439-98-7
- Formula
- Mo
- MW
- 95.95 g/mol
VQ-017171
Nickel oxide, sputtering target, diam. x thickness 2 inch x 0.125 inch, 99.9%
- CAS
- 1313-99-1
- Formula
- NiO
- MW
- 74.69 g/mol
VQ-017173
Nickel oxide, sputtering target, diam. x thickness 3 inch x 1.5 mm, 99.9%
- CAS
- 1313-99-1
- Formula
- NiO
- MW
- 74.69 g/mol
VQ-017174
Nickel sputtering target dia x thickness 2 inch × 1.5 mm, ≥99.99%
- CAS
- 7440-02-0
- Formula
- Ni
- MW
- 58.69 g/mol
VQ-017176
Nickel sputtering target, diam. x thickness 25.4 mm x 1 mm, 99.9%
- CAS
- 7440-02-0
- Formula
- Ni
- MW
- 58.69 g/mol
VQ-017177
Nickel sputtering target, diam. x thickness 3 inch dia x 2.5 mm, 99.95%
- CAS
- 7440-02-0
- Formula
- Ni
- MW
- 58.69 g/mol
VQ-017178
Nickel sputtering target, diam. x thickness 4 inch x 4 mm, 99.99%
- CAS
- 7440-02-0
- Formula
- Ni
- MW
- 58.69 g/mol
VQ-017179
Nickel sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
- CAS
- 7440-02-0
- Formula
- Ni
- MW
- 58.69 g/mol
VQ-017180
Nickel-chromium alloy, sputtering target, 3 inch dia x 2 mm thick, 99.95%
- CAS
- 11106-97-1
- Formula
- CrNi
- MW
- 110.69 g/mol
VQ-017181
Niobium nitride sputtering target, diam. x thickness 4 inch x 6 mm, 99.5%
- CAS
- 24621-21-4
- Formula
- NNb
- MW
- 106.91 g/mol
VQ-017183
Niobium sputtering target, diam. × thickness 2 inch × 0.125 inch, 99.95%
- CAS
- 7440-03-1
- Formula
- Nb
- MW
- 92.91 g/mol
VQ-017187
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