Copper shot, 6 mm (0.24in) & down, 99.9999% (metals basis)
- CAS
- 7440-50-8
- Formula
- Cu
- MW
- 63.55 g/mol
VQ-016763
Product division
Inorganic Chemicals, Metals & Advanced Materials
Inorganic salts, high-purity metals and oxides, rare earth compounds, catalysts precursors and materials for labs, electronics and industry.
5,224products
6sub-categories
10in stock
COA + SDSwith every lot
Inorganic Compounds & Salts 2,555Metals & Alloys 1,265Nanomaterials 582Crystal Optics & Photonics 387Materials Science 283Metal Catalysts & Ligands 152
Copper slug, 3.175mm (0.125in) dia x 3.175mm(0.125in) length, 99.995%
- CAS
- 7440-50-8
- Formula
- Cu
- MW
- 63.55 g/mol
VQ-016766
Copper slug, 6.35mm (0.25in) dia x 6.35mm (0.25in) length, 99.9999%
- CAS
- 7440-50-8
- Formula
- Cu
- MW
- 63.55 g/mol
VQ-016767
Copper sputtering target, diam. × thickness 2 inch × 0.125 inch, 99.99%
- CAS
- 7440-50-8
- Formula
- Cu
- MW
- 63.55 g/mol
VQ-017082
Copper sputtering target, diam. × thickness 2 inch × 0.25 inch, 99.995%
- CAS
- 7440-50-8
- Formula
- Cu
- MW
- 63.55 g/mol
VQ-017083
Copper sputtering target, diam. x thickness 2 inch x 3 mm, 99%
- CAS
- 7440-50-8
- Formula
- Cu
- MW
- 63.55 g/mol
VQ-017076
Copper sputtering target, diam. x thickness 25.4 mm x 1 mm, 99.9%
- CAS
- 7440-50-8
- Formula
- Cu
- MW
- 63.55 g/mol
VQ-017077
Copper sputtering target, diam. x thickness 3 inch x 3 mm, 99.99%
- CAS
- 7440-50-8
- Formula
- Cu
- MW
- 63.55 g/mol
VQ-017078
Copper sputtering target, diam. x thickness 50 mm x 5 mm, 99.99%
- CAS
- 7440-50-8
- Formula
- Cu
- MW
- 63.55 g/mol
VQ-017079
Copper sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
- CAS
- 7440-50-8
- Formula
- Cu
- MW
- 63.55 g/mol
VQ-017080
Copper sputtering target, diam. x thickness 50.8 mm x 3 mm, 99.99%
- CAS
- 7440-50-8
- Formula
- Cu
- MW
- 63.55 g/mol
VQ-017081
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