Chapter 90 · Chemical products
HSN code 9001 — chemicals list
159 products in our catalogue fall under HSN heading 9001. Eight-digit codes shown are indicative. Your customs broker confirms final classification.
9001 10590019002 4290019090 12
Samarium cobalt alloy, sputtering target, diam. x thickness 50.8 mm x 1 mm (1:5%)
- Cat. No.
- VQ-017217
VQ-017217
SI wafers, P-type, dia 4 inch, thick 0.525 mm [Thermal oxide wafer 300 nm SiO2 layer on Si (100)]
- Cat. No.
- VQ-018090
VQ-018090
Silicon carbide (4H-SiC Epitaxial Wafer) wafers, dia 101 mm, thick 0.35 mm
- CAS
- 409-21-2
- Formula
- CSi
- MW
- 40.1 g/mol
VQ-018294
Silicon carbide (4H-SiC) wafers, dia 76.2 mm, thick 0.35 mm
- CAS
- 409-21-2
- Formula
- CSi
- MW
- 40.1 g/mol
VQ-018297
Silicon substrate (single side polished), P-type, diam. × thickness 1 in. × 300 - 400 μm
- CAS
- 7440-21-3
- Formula
- Si
- MW
- 28.09 g/mol
VQ-018101
Silicon substrate (single side polished), P-type, diam. × thickness 2 in. × 300 - 400 μm
- CAS
- 7440-21-3
- Formula
- Si
- MW
- 28.09 g/mol
VQ-018102
Silicon substrate, single side polished, 10 mm x 10 mm x 1 mm
- CAS
- 7440-21-3
- Formula
- Si
- MW
- 28.09 g/mol
VQ-018103
Silicon wafer (single substrase), n-type, contains Arsenic as dopant, diam. × thickness 4 in. × 0.2 mm
- CAS
- 7440-21-3
- Formula
- Si
- MW
- 28.09 g/mol
VQ-018300
Silicon wafer (single substrase), N-type, contains phosphorus (Ph) as dopant, diam. x thickness 100 mm x 0.525 mm
- CAS
- 7440-21-3
- Formula
- Si
- MW
- 28.09 g/mol
VQ-018301
Silicon wafer (single substrase), n-type, contains Phosphorus as dopant, diam. × thickness 2 inch x 0.3 mm
- CAS
- 7440-21-3
- Formula
- Si
- MW
- 28.09 g/mol
VQ-018302
Silicon wafer (single substrase), p-type, contains Boron (B) as dopant, diam. × thickness 2 in. × 0.1 mm
- CAS
- 7440-21-3
- Formula
- Si
- MW
- 28.09 g/mol
VQ-018304
Silicon wafer (single substrase), p-type, contains Boron (B) as dopant, diam. x thickness 100 mm x 0.525 mm
- CAS
- 7440-21-3
- Formula
- Si
- MW
- 28.09 g/mol
VQ-018303
Silicon wafer (single substrase), p-type, contains Boron (B) as dopant, size × thickness 125 mm × 125 mm × 0.2 mm
- CAS
- 7440-21-3
- Formula
- Si
- MW
- 28.09 g/mol
VQ-018305
Silicon wafer (single substrase), p-type, contains Boron as dopant, diam. × thickness 2 inch x 0.3 mm
- CAS
- 7440-21-3
- Formula
- Si
- MW
- 28.09 g/mol
VQ-018306
Silicon wafer, p-type, contains Boron (B) as dopant, diam. x thickness 150 mm x 320 μm
- Cat. No.
- VQ-018307
VQ-018307
Silicon wafer, P-type, contains boron as dopant, diam. × thickness 4 inch × 0.525mm
- CAS
- 7440-21-3
- Formula
- Si
- MW
- 28.09 g/mol
VQ-018123
Silicon wafers, N-type, dia 4 inch, thick 0.50 mm [Thermal oxide wafer 300 nm SiO2 layer on Si (100)]
- Cat. No.
- VQ-018130
VQ-018130
Silicon wafers, P-type, dia 4 inch, thick 0.525 mm [Thermal oxide wafer 100 nm SiO2 layer on Si (100)]
- Cat. No.
- VQ-018131
VQ-018131
Strontium titanium oxide substrate, 10 mm x 10 mm x 0.5 mm, polished one side, orientation, 99.99%
- CAS
- 12060-59-2
- Formula
- O3SrTi
- MW
- 183.49 g/mol
VQ-018311
Strontium titanium oxide substrate, 10 mm x 10 mm x 5 mm
- CAS
- 12060-59-2
- Formula
- O3SrTi
- MW
- 183.49 g/mol
VQ-018312
Strontium titanium oxide substrate, L × W × thickness 10 mm × 10 mm × 0.5 mm
- CAS
- 12060-59-2
- Formula
- O3SrTi
- MW
- 183.49 g/mol
VQ-018313
Strontium titanium oxide wafer, diam. × thickness 1 in x 0.5 mm
- CAS
- 12060-59-2
- Formula
- O3SrTi
- MW
- 183.49 g/mol
VQ-018314
Yttrium-Stabilized Zirconia single crystal substrates, 10mm x 10mm x 0.5mm
- Cat. No.
- VQ-018324
VQ-018324